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Auto500 system for DC and RF sputtering
The Auto500 can be configured as a capable and versatile sputtering system for research. The systems can be fitted with up to three sputter sources while a versatile switching system allows users to select operation from DC or RF power supplies. The range of options includes process gas systems and work holders to provide maximum process flexibility.


Auto500 for multi-process applications
The versatile Auto500 can be configured for multi-technique applications. The spacious FL500 chamber can accommodate the compact EB3, 3kW electron beam source with sputtering and resistance sources to provide researchers with the means to create multi layer films using different techniques without breaking vacuum. The system can also accommodate glow discharge cleaning and substrate heating plus film thickness monitoring and control.